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Patent Searching and Data

Document Type and Number:
WIPO Patent Application WO/2010/044310
Kind Code:
Provided is a drying method capable of preventing the flow of a supplied inert gas from locally concentrating and remaining at the center of a substrate when the pressure in a closed container is reset to the atmospheric pressure by supplying the inert gas thereinto after the substrate onto which a coating liquid such as a resist liquid containing a volatile solvent is applied is dried under reduced pressure in the closed container. The drying method comprises a pressure reduction step for volatilizing a solvent of a coating liquid applied onto a roughly quadrangular substrate in a closed container, and a pressure resetting step for resetting the pressure in the closed container to an atmospheric pressure by supplying an inert gas into the closed container via a gas supply path by a gas supply means after the pressure reduction step, wherein the gas supply means comprises a long purge nozzle for ejecting the inert gas in the closed container, the purge nozzle is provided apart from each side of a pair of opposite sides of the substrate so as to be approximately parallel to each side, and the pressure restoration step is performed by the purge nozzle which ejects the inert gas toward the closed container inner wall side opposite to the substrate side.

IKEDA, Masataka (())
Application Number:
Publication Date:
April 22, 2010
Filing Date:
August 17, 2009
Export Citation:
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SHARP KABUSHIKI KAISHA (22-22, Nagaike-cho Abeno-ku, Osaka-sh, Osaka 22, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町22番22号 Osaka, 〒5458522, JP)
International Classes:
B05D3/04; B05C9/12; F26B5/04; F26B9/06; F26B21/14; G02F1/13; H01L21/027
Foreign References:
Attorney, Agent or Firm:
UENO, Noboru (KS Iseya Building 8th Floor, 21-23 Sakae 3-chome, Naka-ku, Nagoya-sh, Aichi 08, 〒4600008, JP)
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