Title:
DRYING RESIST WITH A SOLVENT BATH AND SUPERCRITICAL CO2
Document Type and Number:
WIPO Patent Application WO2003070846
Kind Code:
A3
Abstract:
A method (10) for drying an object having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid (20) and the object is placed in a solvent bath (20) before a sufficient amount of the rinse liquid can evaporate from the object (20). The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath (30). A drying process is performed (40).
Inventors:
ARENA-FOSTER CHANTAL J
AWTREY ALLAN WENDELL
RYZA NICHOLAS ALAN
SHILLING PAUL
AWTREY ALLAN WENDELL
RYZA NICHOLAS ALAN
SHILLING PAUL
Application Number:
PCT/US2003/004698
Publication Date:
November 27, 2003
Filing Date:
February 14, 2003
Export Citation:
Assignee:
SUPERCRITICAL SYSTEMS INC (US)
International Classes:
B81C1/00; F26B3/00; F26B5/06; G03F7/40; (IPC1-7): G03C5/00; B08B3/00
Foreign References:
| US6358673B1 | 2002-03-19 | |||
| US6562146B1 | 2003-05-13 |
Download PDF:
Previous Patent: WIRE ENAMELS THAT ARE DEVOID OF OR LOW IN CRESOL
Next Patent: ACRYLIC PRESSURE SENSITIVE ADHESIVE FOR THE POLARIZING FILM
Next Patent: ACRYLIC PRESSURE SENSITIVE ADHESIVE FOR THE POLARIZING FILM