Title:
DUST REMOVING MATERIAL AND DUST REMOVAL METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2011/111416
Kind Code:
A1
Abstract:
Disclosed are: a dust removing material, which is capable of surely capturing and removing the dust that adheres to a recessed and projected surface of an object of dust removal such as the surface of a microlens, and which is free from transfer of a resin or other components thereof to the recessed and projected surface; and a dust removal method using the dust removing material. Specifically disclosed is a dust removing material (1) wherein a hot melt layer (3) is formed on the surface of a plastic film (2) that serves as a supporting body. The hot melt layer (3) is bonded to a recessed and projected surface (11) of an object of dust removal by thermocompression and then cooled, thereby removing the dust adhering to the recessed and projected surface. The hot melt layer (3) is composed of a thermoplastic resin layer that contains a thermoplastic resin having a softening temperature within the range of 110-170˚C or a plurality of kinds of thermoplastic resins having different softening temperatures. At the time of dust removal, the hot melt layer (3) of the dust removing material (1) is bonded to the recessed and projected surface (11) by thermocompression at a temperature not higher than the softening temperatures of the thermoplastic resins, and then cooled, and subsequently the dust removing material (1) is separated from the recessed and projected surface (11).
Inventors:
SHINYA, Yoshihisa (Kanuma Plant No. 3 1078, Kami-ishikawa, Kanuma-sh, Tochigi 03, 〒3228503, JP)
新家 由久 (〒03 栃木県鹿沼市上石川１０７８ ソニーケミカル＆インフォメーションデバイス株式会社 鹿沼事業所 第３工場内 Tochigi, 〒3228503, JP)
新家 由久 (〒03 栃木県鹿沼市上石川１０７８ ソニーケミカル＆インフォメーションデバイス株式会社 鹿沼事業所 第３工場内 Tochigi, 〒3228503, JP)
Application Number:
JP2011/050580
Publication Date:
September 15, 2011
Filing Date:
January 14, 2011
Export Citation:
Assignee:
SONY CHEMICAL & INFORMATION DEVICE CORPORATION (Gate City Osaki, East Tower 8F 1-11-2, Osaki, Shinagawa-k, Tokyo 32, 〒1410032, JP)
ソニーケミカル＆インフォメーションデバイス株式会社 (〒32 東京都品川区大崎１丁目１１番２号 ゲートシティ大崎イーストタワー８階 Tokyo, 〒1410032, JP)
SHINYA, Yoshihisa (Kanuma Plant No. 3 1078, Kami-ishikawa, Kanuma-sh, Tochigi 03, 〒3228503, JP)
ソニーケミカル＆インフォメーションデバイス株式会社 (〒32 東京都品川区大崎１丁目１１番２号 ゲートシティ大崎イーストタワー８階 Tokyo, 〒1410032, JP)
SHINYA, Yoshihisa (Kanuma Plant No. 3 1078, Kami-ishikawa, Kanuma-sh, Tochigi 03, 〒3228503, JP)
International Classes:
B08B7/00; A47L25/00
Attorney, Agent or Firm:
KOIKE, Akira et al. (32F St. Luke's Tower, 8-1 Akashi-cho, Chuo-k, Tokyo 44, 〒1040044, JP)
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