Title:
DYNAMIC MASK PROJECTION STEREO MICRO LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2002027408
Kind Code:
A3
Abstract:
Three-dimensional structures are fabricated by a process in which a 3D solid model is designed by software at a PC and sliced into a series of 2D layers. Each 2D layer is displayed at a dynamic mask via micro-mirror deflections projected onto a photoresist to form a layer, which is lowered and the process is repeated to build the object layer by layer.
Inventors:
ZHANG XIANG (US)
Application Number:
PCT/US2001/030604
Publication Date:
January 09, 2003
Filing Date:
September 27, 2001
Export Citation:
Assignee:
UNIV CALIFORNIA (US)
ZHANG XIANG (US)
ZHANG XIANG (US)
International Classes:
B29C67/00; G03F7/00; G03F7/20; G21K5/00; (IPC1-7): G03F7/20; B29C67/00; B81C1/00
Domestic Patent References:
| WO1998004950A1 | 1998-02-05 | |||
| WO1999063385A1 | 1999-12-09 |
Foreign References:
| US5523193A | 1996-06-04 |
Other References:
IKUTA K ET AL: "Development of mass productive micro stereo lithography (Mass-IH process)", MICRO ELECTRO MECHANICAL SYSTEMS, 1996, MEMS '96, PROCEEDINGS. AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND SYSTEMS. IEEE, THE NINTH ANNUAL INTERNATIONAL WORKSHOP ON SAN DIEGO, CA, USA 11-15 FEB. 1996, NEW YORK, NY, USA,IEEE, 11 February 1996 (1996-02-11), pages 301 - 306, XP010159405, ISBN: 0-7803-2985-6
Download PDF:
Previous Patent: ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
Next Patent: CONTRAST ENHANCEMENT FOR LITHOGRAPHY ALIGNMENT MARK RECOGNITION
Next Patent: CONTRAST ENHANCEMENT FOR LITHOGRAPHY ALIGNMENT MARK RECOGNITION