Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EASILY-TORN FILM, MULTILAYER FILM, PACKAGING MATERIAL, AND CONTAINER
Document Type and Number:
WIPO Patent Application WO/2019/026499
Kind Code:
A1
Abstract:
Provided are: an easily-torn film that has excellent straight-line cutability, high oxygen barrier properties, and a low modulus of elasticity; a multilayer film; a packaging material; and a container. An easily-torn film that includes a polyamide resin component that comprises: more than 20 parts by mass but no more than 70 parts by mass of a semi-aromatic polyamide resin A; and at least 30 parts by mass but less than 80 parts by mass of an aliphatic polyamide resin B. The semi-aromatic polyamide resin A is configured from diamine-derived structural units and dicarboxylic-acid-derived structural units. At least 60 mol% of the diamine-derived structural units are derived from meta xylene diamine, and at least 60 mol% of the dicarboxylic-acid-derived structural units are derived from C4–10 α,ω-straight-chain aliphatic dicarboxylic acids. The molar concentration of phosphorous atoms, the total molar concentration of alkali metal atoms, and the total molar concentration of alkali earth metal atoms in the semi-aromatic polyamide resin satisfy a prescribed relationship with Mn.

Inventors:
OTSUKA Kosuke (INC. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chome, Hiratsuka-sh, Kanagawa 16, 〒2540016, JP)
ODA Takafumi (INC. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chome, Hiratsuka-sh, Kanagawa 16, 〒2540016, JP)
Application Number:
JP2018/024807
Publication Date:
February 07, 2019
Filing Date:
June 29, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2 Marunouchi 2-chome, Chiyodaku Tokyo, 24, 〒1008324, JP)
International Classes:
C08L77/00; B29C55/12; B32B27/32; B32B27/34; B32B27/36; B65D65/40; C08G69/26; C08J5/18; C08L77/06; B29K77/00; B29L7/00
Domestic Patent References:
WO2012014772A12012-02-02
WO2012077473A12012-06-14
WO2011145498A12011-11-24
WO2011145497A12011-11-24
WO2007139200A12007-12-06
Foreign References:
JP2008024744A2008-02-07
JPH0699491A1994-04-12
Attorney, Agent or Firm:
SIKS & CO. (8th Floor, Kyobashi-Nisshoku Bldg. 8-7, Kyobashi 1-chome, Chuo-k, Tokyo 31, 〒1040031, JP)
Download PDF: