Title:
ECCENTRICITY AMOUNT MEASUREMENT METHOD AND ECCENTRICITY AMOUNT MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/002272
Kind Code:
A1
Abstract:
Provided is a method for measuring an eccentricity amount by radiating beams of light into a test optical system disposed on a measurement axis, wherein the method includes: an acquisition step (S100) for acquiring wavefront data on the basis of the beams of light emitted from the test optical system; a first extraction step (S200) for extracting prescribed aberration components from the wavefront data; a second extraction step (S300) for extracting a first aberration component from the prescribed aberration components; and an analysis step (S400) for analyzing simultaneous linear equations with respect to the first aberration component, eccentric aberration sensitivity, and an eccentricity amount. The prescribed aberration components include aberration components generated by eccentricity. The first aberration component is an aberration component, from among the prescribed aberration components, which is proportional to the eccentricity amount multiplied by one. The eccentric aberration sensitivity is aberration sensitivity proportional to the eccentricity amount multiplied by one.
Inventors:
SATO YOSUKE (JP)
Application Number:
PCT/JP2015/059056
Publication Date:
January 07, 2016
Filing Date:
March 25, 2015
Export Citation:
Assignee:
OLYMPUS CORP (JP)
International Classes:
G01M11/00
Foreign References:
| JP2001147174A | 2001-05-29 | |||
| JP2014115077A | 2014-06-26 | |||
| JP2007033343A | 2007-02-08 | |||
| JP2014020881A | 2014-02-03 | |||
| JP2013195410A | 2013-09-30 | |||
| JP2012163899A | 2012-08-30 | |||
| JP2005024504A | 2005-01-27 | |||
| JP2003257812A | 2003-09-12 |
Attorney, Agent or Firm:
SAITO Keisuke et al. (JP)
Keisuke Saito (JP)
Keisuke Saito (JP)
Download PDF: