Title:
ELECTRO STATIC CHUCK AND PLASMA PROCESSING EQUIPMENT
Document Type and Number:
WIPO Patent Application WO/2019/015136
Kind Code:
A1
Abstract:
An electro static chuck, comprising a base (5), a heating layer (6) provided on the base, and an insulating layer (7) provided on the heating layer. An annular protection member (8) which surrounds the outer circumferential wall of the heating layer is provided between the base and the insulating layer. The annular protection member is made of an elastic material which is resistant to plasma corrosion, and the annular protection member is in a compressive deformation state between the base and the insulating layer to implement isolation between the heating layer and plasma, so that the protection effect on the heating layer can be improved. Moreover, the annular protection member can be replaced regularly without damaging the heating layer, so that the service life of the electro static chuck is prolonged.
Inventors:
LIU JIAN (CN)
Application Number:
PCT/CN2017/105838
Publication Date:
January 24, 2019
Filing Date:
October 12, 2017
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01L21/683; H01J37/20
Foreign References:
| CN107195578A | 2017-09-22 | |||
| CN1848404A | 2006-10-18 | |||
| CN106298411A | 2017-01-04 |
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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