Title:
ELECTRODE FOR METAL PLATING AND PLATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2003/060200
Kind Code:
A1
Abstract:
An electrode for metal plating which comprises a porous material being capable of conducting electricity at least on its surface and having been formed by heating and pressing a particulate material.
More Like This:
WO/2019/223499 | ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD |
JP2024040555 | Method of forming metal film |
WO/2015/121462 | ELECTROCHEMICAL DEVICE AND APPARATUS AND METHODS IMPLEMENTING SUCH AN APPARATUS |
Inventors:
KAWANA EISHIROU (JP)
HYODO KIYOSHI (JP)
YAMAGUCHI SEIJI (JP)
HYODO KIYOSHI (JP)
YAMAGUCHI SEIJI (JP)
Application Number:
PCT/JP2002/000282
Publication Date:
July 24, 2003
Filing Date:
January 17, 2002
Export Citation:
Assignee:
FUJITSU LTD (JP)
KAWANA EISHIROU (JP)
HYODO KIYOSHI (JP)
YAMAGUCHI SEIJI (JP)
KAWANA EISHIROU (JP)
HYODO KIYOSHI (JP)
YAMAGUCHI SEIJI (JP)
International Classes:
C25D17/10; C25D17/12; H05K3/42; (IPC1-7): C25D17/10
Foreign References:
JPH0953200A | 1997-02-25 |
Attorney, Agent or Firm:
Itoh, Tadahiko (Yebisu Garden Place Tower 20-3, Ebisu 4-chom, Shibuya-ku Tokyo, JP)
Download PDF:
Previous Patent: VOLATILE SOLID CORROSION INHIBITOR
Next Patent: SYSTEM AND METHOD FOR ITEMS TO BE ELECTROCHEMICALLY TREATED
Next Patent: SYSTEM AND METHOD FOR ITEMS TO BE ELECTROCHEMICALLY TREATED