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Title:
ELECTROFORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/035417
Kind Code:
A1
Abstract:
A matrix (11) is fabricated by opening a cavity (15) in an insulating layer (14) formed over the upper face of an electroconductive base material (13).  The matrix (11) is arranged in an electrolytic bath, and a voltage is applied thereto, so that a metal is electrically deposited on the bottom face of the cavity (15), thereby to form a metal molding (12) electrically in the cavity (15).  If the cavity (15) has a width (W), and if the head space between the upper face opening of the cavity (15) and the upper face of a metal layer (18) has a vertical height (H), the growth of the metal layer (18) is stopped at the electrodeposition step so that the height (H) of the head space to be left over the metal layer (18) satisfies: H ≥ W/2.85, if 300 μm ≤ W; H ≥ W/3.75, if 200 μm ≤ W < 300 μm; H ≥ W/4, if 100 μm ≤ W < 200 μm; and H ≥ W/10, if W < 100 μm.

Inventors:
SEKI, Kazumasa (C/O OMRON CORPORATION, 801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
関寿昌 (〒30 京都府京都市下京区塩小路通堀川東入南不動堂町801番地 オムロン株式会社内 Kyoto, 〒6008530, JP)
HATAMURA, Akihiko (C/O OMRON CORPORATION, 801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
畑村章彦 (〒30 京都府京都市下京区塩小路通堀川東入南不動堂町801番地 オムロン株式会社内 Kyoto, 〒6008530, JP)
YOSHIDA, Hitoshi (C/O OMRON CORPORATION, 801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
Application Number:
JP2009/004522
Publication Date:
April 01, 2010
Filing Date:
September 11, 2009
Export Citation:
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Assignee:
OMRON CORPORATION (801 Minamifudodo-cho, Horikawahigashiiru Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
オムロン株式会社 (〒30 京都府京都市下京区塩小路通堀川東入南不動堂町801番地 Kyoto, 〒6008530, JP)
SEKI, Kazumasa (C/O OMRON CORPORATION, 801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
関寿昌 (〒30 京都府京都市下京区塩小路通堀川東入南不動堂町801番地 オムロン株式会社内 Kyoto, 〒6008530, JP)
HATAMURA, Akihiko (C/O OMRON CORPORATION, 801 Minamifudodo-cho, Horikawahigashiiru, Shiokoji-dori, Shimogyo-ku, Kyoto-sh, Kyoto 30, 〒6008530, JP)
畑村章彦 (〒30 京都府京都市下京区塩小路通堀川東入南不動堂町801番地 オムロン株式会社内 Kyoto, 〒6008530, JP)
International Classes:
C25D1/00
Foreign References:
JPH0864145A1996-03-08
JPH08138941A1996-05-31
JP2001205599A2001-07-31
JPH04183892A1992-06-30
JPH08225983A1996-09-03
Attorney, Agent or Firm:
NAKANO, Masayoshi (Ogura Temmabashi Building, 3-5 Tanimachi 1-chome, Chuo-ku, Osaka-sh, Osaka 12, 〒5400012, JP)
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