Title:
ELECTROMAGNET DEVICE AND MAGNETIC RESONANCE IMAGING DEVICE
Document Type and Number:
WIPO Patent Application WO/2008/062599
Kind Code:
A1
Abstract:
An electromagnet device which generates magnetostatic field in the direction perpendicular
to the inserting direction of an inspecting subject is reduced in size and weight
by removing unnecessary arrangement as much as possible. A magnetic resonance
imaging device is also provided. The electromagnet device comprises a first
coil (31) through which a first circular current (J1) circulates forward, a second
coil (32) through which a second circular current (J2) circulates reversely,
and a coil group (30) through which a plurality of circular currents (J3-J6) circulate
alternately forward and reversely. The first coil (31), the second coil (32)
and the coil group (30) are arranged in this order to increase the angle of elevation
θ (θ1<θ2<θ3), and a blank region (S) not including
the second coil (32) and the coil group (30) exists in the angular region between
the angles of elevation θ2 and θ3.
More Like This:
Inventors:
ABE MITSUSHI (JP)
WATANABE HIROYUKI (JP)
TAKESHIMA HIROTAKA (JP)
WATANABE HIROYUKI (JP)
TAKESHIMA HIROTAKA (JP)
Application Number:
PCT/JP2007/068154
Publication Date:
May 29, 2008
Filing Date:
September 19, 2007
Export Citation:
Assignee:
HITACHI LTD (JP)
HITACHI MEDICAL CORP (JP)
ABE MITSUSHI (JP)
WATANABE HIROYUKI (JP)
TAKESHIMA HIROTAKA (JP)
HITACHI MEDICAL CORP (JP)
ABE MITSUSHI (JP)
WATANABE HIROYUKI (JP)
TAKESHIMA HIROTAKA (JP)
International Classes:
A61B5/055; G01R33/381; H01F6/00; H01F7/20
Domestic Patent References:
WO2002027345A1 | 2002-04-04 | |||
WO1999027851A1 | 1999-06-10 |
Foreign References:
JP2003513436A | 2003-04-08 | |||
JP2002010993A | 2002-01-15 | |||
JP2005304597A | 2005-11-04 | |||
JP2002336215A | 2002-11-26 | |||
JPH09238917A | 1997-09-16 |
Attorney, Agent or Firm:
ISONO, Michizo (Sabo Kaikan Annex7-4, Hirakawa-cho 2-chom, Chiyoda-ku Tokyo 93, JP)
Download PDF:
Previous Patent: VACUUM PUMP
Next Patent: SILICON STRUCTURE WITH OPENING HAVING HIGH ASPECT RATIO, METHOD FOR MANUFACTURING THE SILICON STRUCT...
Next Patent: SILICON STRUCTURE WITH OPENING HAVING HIGH ASPECT RATIO, METHOD FOR MANUFACTURING THE SILICON STRUCT...