ELECTROMAGNETIC REFLECTION APPARATUS AND BASE STATION

WIPO Patent Application WO/2024/027627

A1

Provided are an electromagnetic reflection apparatus and a base station. The electromagnetic reflection apparatus comprises a radiation portion and a phase modulation portion, which are arranged in a stacked manner. The radiation portion comprises a radiation piece, which is used for receiving and transmitting an electromagnetic signal. The phase modulation portion comprises a coupling structure and a phase modulation structure, wherein the coupling structure is located between the radiation piece and the phase modulation structure, and the coupling structure is used for making the electromagnetic signal transmit between the radiation piece and the phase modulation structure; and the phase modulation structure comprises a phase modulation assembly, which comprises a feed strip line, and a plurality of phase modulation strip lines having different lengths, which feed strip line is used for transmitting the electromagnetic signal by means of the coupling structure and the radiation piece, and can be electrically connected to any phase modulation strip line so as to change the reflection phase of the electromagnetic signal. When the structure is used, the reflection phase of an electromagnetic wave can be adjusted within a relatively wide operating bandwidth, and the adjustment precision is relatively high.

HOU YUEFENG (CN)
GAO XINYU (CN)
WU HENGHENG (CN)

PCT/CN2023/110166

February 08, 2024

July 31, 2023

Click for automatic bibliography generation  

HUAWEI TECH CO LTD (CN)

H01Q15/00; H01Q15/14

WO2022022160A1

2022-02-03

CN112736478A	2021-04-30
CN114122733A	2022-03-01
CN114267956A	2022-04-01
CN114583462A	2022-06-03
CN113782980A	2021-12-10
KR102181804B1	2020-11-24

TDIP & PARTNERS (CN)

View/Download PDF      PDF Help

Previous Patent: QOE MEASUREMENT CONFIGURATION METHOD, AND MASTER NODE AND SECOND NODE

Next Patent: COMMUNICATION METHOD AND APPARATUS