Title:
ELECTRON BEAM APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/064521
Kind Code:
A1
Abstract:
An electron beam exposure apparatus has a plurality of electron beam optical systems (70i) that each make electrons into an electron beam (EB) and bombard a target therewith, said electrons being produced from a photoelectric conversion layer of a photoelectric element (54i) due to irradiation with at least one light beam. Each of the plurality of electron beam optical systems (70i) has electromagnetic lenses (e.g. 70a, 70b), and pathway members (e.g. 196i, 202i) that delineate electron beam pathways from a space (34) in which a plurality of the photoelectric elements (54i) are positioned. The electron beam pathways are each isolated from spaces in which the electromagnetic lenses are positioned.
Inventors:
SATO SHINJI (JP)
Application Number:
PCT/JP2017/035581
Publication Date:
April 04, 2019
Filing Date:
September 29, 2017
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Foreign References:
| JP2016086103A | 2016-05-19 | |||
| JP2005347572A | 2005-12-15 | |||
| JP2005332929A | 2005-12-02 | |||
| JP2005332922A | 2005-12-02 | |||
| JP2001144000A | 2001-05-25 | |||
| JPH04252015A | 1992-09-08 | |||
| JPH0472611A | 1992-03-06 | |||
| JPS62293719A | 1987-12-21 | |||
| JPS6017918A | 1985-01-29 |
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
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