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Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS AND DEVICE PRODUCTION METHOD, AND PHOTOELECTRIC ELEMENT HOLDING CONTAINER
Document Type and Number:
WIPO Patent Application WO/2018/155539
Kind Code:
A1
Abstract:
This electron beam apparatus comprises a projection optical system which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron beams, electrons discharged from the photoelectric element, a lid storage plate (68) which supports a lid member (64) released from a main body (52) having the electron discharge surface of the photoelectric element positioned in an internal space thereof, and an actuator (66) for moving the lid storage plate. The lid member (64) can be fitted in a releasable manner to the main body so as to close the opening in the main body, and when the lid member is released from the main body and the lid member supported by the lid storage plate is moved to a retreat position, electrons discharged from the electron discharge surface can move towards the electron beam optical system after passing through the opening in the main body.

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006397
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01J37/073; G03F7/20; H01J37/305; H01L21/027
Foreign References:
JP2003045368A2003-02-14
JP2015133400A2015-07-23
JP2015022810A2015-02-02
JP2005332922A2005-12-02
JP2007080697A2007-03-29
JP2002313214A2002-10-25
US20120223245A12012-09-06
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
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