Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/155537
Kind Code:
A1
Abstract:
This electron beam apparatus comprises an optical device (84) capable of providing a plurality of light beams which can be controlled individually, a projection optical system (86) which directs the plurality of light beams from the optical device onto a photoelectric element (54), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron beams, electrons discharged from the photoelectric element (54) as a result of the plurality of light beams being directed onto the photoelectric element, wherein the intensity of at least one of the plurality of light beams directed onto the photoelectric element (54) can be varied.

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006391
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/073; H01J37/305
Domestic Patent References:
WO2006123447A12006-11-23
WO2003040829A22003-05-15
WO2002013226A22002-02-14
WO1997003453A21997-01-30
WO2001026134A12001-04-12
Foreign References:
JP2011258842A2011-12-22
JP2000036459A2000-02-02
JP2003045368A2003-02-14
US20120223245A12012-09-06
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
Download PDF: