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Title:
ELECTRON BEAM APPARATUS AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/155538
Kind Code:
A1
Abstract:
This electron beam apparatus comprises: an optical device (84) capable of providing a plurality of light beams which can be controlled individually; an illuminating system (82) which can direct illuminating light onto the optical device; a projection optical system (86) which can direct the plurality of light beams from the optical device (84) onto a photoelectric element (54); and an electron beam optical system (70) which can irradiate a wafer (W) with, as a plurality of electron beams, electrons discharged from the photoelectric element (54) as a result the plurality of optical beams being directed onto the photoelectric element (54).

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006396
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/04; H01J37/06; H01J37/073; H01J37/09; H01J37/305
Domestic Patent References:
WO2006123447A12006-11-23
WO2003040829A22003-05-15
WO2002013226A22002-02-14
WO1997003453A21997-01-30
WO2001026134A12001-04-12
Foreign References:
JP2000036459A2000-02-02
JP2011258842A2011-12-22
JP2003045368A2003-02-14
US20120223245A12012-09-06
JP2012178437A2012-09-13
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
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