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Title:
ELECTRON BEAM APPARATUS AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/155540
Kind Code:
A1
Abstract:
This electron beam apparatus comprises: an optical system (80) which directs a plurality of light beams onto a photoelectric element (136); and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron beams, electrons discharged from the photoelectric conversion layer of the photoelectric element. The photoelectric element has a photoelectric conversion layer which is positioned on the optical path of light from the optical system, has a plurality of apertures formed on the incident surface side, and is irradiated with the plurality of beams which have passed through said plurality of apertures. The shape of at least one of the plurality of apertures is different from the shape of the area on the wafer which is irradiated with the electron beams generated by the light beams which have passed through the aperture entering the photoelectric conversion layer.

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006400
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
WO2006123447A12006-11-23
Foreign References:
JPH06236840A1994-08-23
JP2005533365A2005-11-04
US20120223245A12012-09-06
JPH10214766A1998-08-11
JP2015041648A2015-03-02
JP2005347572A2005-12-15
JP2004506296A2004-02-26
JP2000036459A2000-02-02
JPH1197331A1999-04-09
JP2011258842A2011-12-22
JP2005332922A2005-12-02
JPH07254539A1995-10-03
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
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