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Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/155542
Kind Code:
A1
Abstract:
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (136), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron beams, electrons discharged from the photoelectric conversion layer of the photoelectric element as a result of the plurality of light beams being directed onto the photoelectric element, wherein the photoelectric element wherein the photoelectric element has a photoelectric layer which is positioned on the optical path of light from the optical system, which has a plurality of apertures formed on the incident surface side thereof, and which is irradiated with the plurality of beams which have passed through the plurality of apertures.

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006405
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Foreign References:
US20120223245A12012-09-06
JPH07254539A1995-10-03
JPH1197331A1999-04-09
JP2013093567A2013-05-16
JP2010041055A2010-02-18
JP2005533365A2005-11-04
JP2013055145A2013-03-21
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
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