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Title:
ELECTRON BEAM APPARATUS AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/155545
Kind Code:
A1
Abstract:
This electron beam apparatus comprises an optical system (80) which directs a plurality of optical beams onto a photoelectric element (54), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron beams, electrons discharged as a result of the plurality of light beams from the optical system (80) being directed onto the photoelectric element, wherein the pitch of the plurality of electron beams can be varied.

Inventors:
SATO, Shinji (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/006412
Publication Date:
August 30, 2018
Filing Date:
February 22, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/073; H01J37/305
Foreign References:
US20120223245A12012-09-06
JP2013055145A2013-03-21
JPH07254539A1995-10-03
JPH1197331A1999-04-09
JP2005533365A2005-11-04
JP2013093567A2013-05-16
Attorney, Agent or Firm:
TATEISHI, Atsuji (TATEISHI & CO, Karakida Center Bldg. 1-53-9, Karakida, Tama-sh, Tokyo 35, 〒2060035, JP)
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