ELECTRON BEAM APPLICATION METHOD, ELECTRON BEAM APPLICATION DEVICE, ELECTRON BEAM APPLICATION DEVICE FOR OPENING-EQUIPPED VESSEL

Title:

ELECTRON BEAM APPLICATION METHOD, ELECTRON BEAM APPLICATION DEVICE, ELECTRON BEAM APPLICATION DEVICE FOR OPENING-EQUIPPED VESSEL

Document Type and Number:

WIPO Patent Application WO/2007/046213

Kind Code:

A1

Abstract:

There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.

Inventors:

EGUCHI SHIRO (JP)
HASHIMOTO ISAO (JP)
SATO SHIGEKATSU (JP)
KOIDE HIDENOBU (JP)
HASHIMOTO NOBUYUKI (JP)
SUZUKI TAKAYUKI (JP)
GOZAKI SATORU (JP)
HIKOSAKA TOMOYUKI (JP)
OKAMOTO YUKIO (JP)
FUJITA HIROYUKI (JP)

Application Number:

PCT/JP2006/318777

Publication Date:

April 26, 2007

Filing Date:

September 21, 2006

Export Citation:

Click for automatic bibliography generation Help

Assignee:

JAPAN AE POWER SYSTEMS CORP (JP)
EGUCHI SHIRO (JP)
HASHIMOTO ISAO (JP)
SATO SHIGEKATSU (JP)
KOIDE HIDENOBU (JP)
HASHIMOTO NOBUYUKI (JP)
SUZUKI TAKAYUKI (JP)
GOZAKI SATORU (JP)
HIKOSAKA TOMOYUKI (JP)
OKAMOTO YUKIO (JP)
FUJITA HIROYUKI (JP)

International Classes:

G21K5/04; A23L3/26; A61L2/08; B65B55/08; G21K5/00

Domestic Patent References:

WO2005108278A2	2005-11-17
WO1998042385A1	1998-10-01

Foreign References:

JPS3718446B1
JP2005247427A	2005-09-15
JP2002308229A	2002-10-23
JP2002341097A	2002-11-27
JP2003302499A	2003-10-24
JP2002255124A	2002-09-11
JPS621200U	1987-01-07
JPH1181051A	1999-03-26
JPH05166487A	1993-07-02
JPH11281798A	1999-10-15
JPH09150813A	1997-06-10
JPH07209498A	1995-08-11
JPH09292498A	1997-11-11
JP2005258019A	2005-09-22
US20050158218A1	2005-07-21
JP2004067233A	2004-03-04

Other References: