Title:
ELECTRON BEAM DIMENSION MEASURING DEVICE AND ELECTRON BEAM DIMENSION MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2008/029696
Kind Code:
A1
Abstract:
An electron beam dimension measuring device and an electron beam dimension measuring method
which can measure a sample with high precision while fixing the potential on the
surface of the sample. The electron beam dimension measuring device comprises a
means for irradiating the surface of the sample with an electron beam, a stage (5)
for mounting the sample (7), an photoelectron generating electrode (52) disposed
oppositely to the sample (7), a UV-ray irradiation means (53) for irradiating UV-rays,
and a control means (20) for making the UV-ray irradiation means (53) irradiate
UV-rays for a predetermined time to cause emission of photoelectrons from the
sample (7) and the photoelectron generating electrode (52) and bringing the
surface potential of the sample (7) to 0 [V] by applying a voltage for supplying energy
equivalent to the difference between energy of photoelectrons emitted from
the sample (7) and energy of photoelectrons emitted from the photoelectron generating
electrode (52) to the photoelectron generating electrode (52). The control
means (20) makes the surface potential of the sample (7) constant before measurement
of dimensions of the sample (7) is started.
Inventors:
KURIBARA, Masayuki (32-1 Asahi-cho 1-chome, Nerima-k, Tokyo 71, 1790071, JP)
Application Number:
JP2007/066838
Publication Date:
March 13, 2008
Filing Date:
August 30, 2007
Export Citation:
Assignee:
ADVANTEST CORPORATION (32-1, Asahi-cho 1-chome Nerima-k, Tokyo 71, 1790071, JP)
株式会社アドバンテスト (〒71 東京都練馬区旭町１丁目３２番１号 Tokyo, 1790071, JP)
株式会社アドバンテスト (〒71 東京都練馬区旭町１丁目３２番１号 Tokyo, 1790071, JP)
International Classes:
G01B15/00; G03F1/08; H01J37/20; H01L21/027; G01B15/00; G03F1/08; H01J37/20; H01L21/02
Attorney, Agent or Firm:
OKAMOTO, Keizo (OKAMOTO PATENT OFFICE Yamanishi Bldg, 4F11-7, Nihonbashi Ningyo-cho 3-chom, Chuo-ku Tokyo 13, 1030013, JP)
Download PDF:
Previous Patent: ELECTROLYTIC CONDENSER, AND ELECTROLYTIC CONDENSER MANUFACTURING METHOD
Next Patent: CONTINUOUSLY VARIABLE TRANSMISSION
Next Patent: CONTINUOUSLY VARIABLE TRANSMISSION