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Title:
ELECTRON BEAM DIMENSION MEASURING DEVICE AND ELECTRON BEAM DIMENSION MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2008/029696
Kind Code:
A1
Abstract:
An electron beam dimension measuring device and an electron beam dimension measuring method which can measure a sample with high precision while fixing the potential on the surface of the sample. The electron beam dimension measuring device comprises a means for irradiating the surface of the sample with an electron beam, a stage (5) for mounting the sample (7), an photoelectron generating electrode (52) disposed oppositely to the sample (7), a UV-ray irradiation means (53) for irradiating UV-rays, and a control means (20) for making the UV-ray irradiation means (53) irradiate UV-rays for a predetermined time to cause emission of photoelectrons from the sample (7) and the photoelectron generating electrode (52) and bringing the surface potential of the sample (7) to 0 [V] by applying a voltage for supplying energy equivalent to the difference between energy of photoelectrons emitted from the sample (7) and energy of photoelectrons emitted from the photoelectron generating electrode (52) to the photoelectron generating electrode (52). The control means (20) makes the surface potential of the sample (7) constant before measurement of dimensions of the sample (7) is started.

Inventors:
KURIBARA MASAYUKI (JP)
Application Number:
PCT/JP2007/066838
Publication Date:
March 13, 2008
Filing Date:
August 30, 2007
Export Citation:
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Assignee:
ADVANTEST CORP (JP)
KURIBARA MASAYUKI (JP)
International Classes:
G01B15/00; G03F1/84; G03F1/86; G21K5/04; H01J37/20; H01J37/28; H01L21/027
Domestic Patent References:
WO2002001596A12002-01-03
Foreign References:
JP2005164451A2005-06-23
JPH11354621A1999-12-24
JPH05290789A1993-11-05
JPS636737A1988-01-12
JP2007078537A2007-03-29
JPH04218941A1992-08-10
JP2005174591A2005-06-30
Attorney, Agent or Firm:
OKAMOTO, Keizo (4F11-7, Nihonbashi Ningyo-cho 3-chom, Chuo-ku Tokyo 13, JP)
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