Title:
ELECTRON-BEAM EXPOSURE METHOD AND ELECTRON-BEAM EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/115139
Kind Code:
A1
Abstract:
In the disclosed method, when rotating and moving a substrate having a light-sensitive film formed thereon and using an electron beam to expose the light-sensitive film, the effective region of the light-sensitive film is divided, in the radial direction of the substrate, into a first region, a second region that is adjacent to and further towards the outside edge of the substrate than the first region, and a third region that is adjacent to and further towards the outside edge of the substrate than the second region. While exposing the second region, the rotational speed of the substrate is changed such that the linear velocity of the substrate through the point being irradiated by the electron beam is constant. While exposing the first region and also while exposing the third region, the rotational speed of the substrate is changed such that the linear velocity of the substrate is slower than the linear velocity used for the second region.
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Inventors:
YAMASHITA Hiroshi (C/O HOYA CORPORATION, 7-5 Nakaochiai 2-chome, Shinjuku-k, Tokyo 25, 〒1618525, JP)
Application Number:
JP2011/056112
Publication Date:
September 22, 2011
Filing Date:
March 15, 2011
Export Citation:
Assignee:
HOYA CORPORATION (7-5 Nakaochiai 2-chome, Shinjuku-ku Tokyo, 25, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合二丁目７番５号 Tokyo, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合二丁目７番５号 Tokyo, 〒1618525, JP)
International Classes:
G03F7/20; G11B5/84; H01L21/027
Attorney, Agent or Firm:
ANIYA Setuo et al. (21 TOWA BLDG. 3F, 6-1 Iidabashi 4-chome, Chiyoda-k, Tokyo 72, 〒1020072, JP)
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