Title:
ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH
Document Type and Number:
WIPO Patent Application WO/2010/044641
Kind Code:
A9
Abstract:
The present invention relates to an electron beam generator with an adjustable beam width. Said electron beam generator comprises: a plasma generating chamber that generates and sustains plasma; an RF power-generating antenna disposed on the outer circumference of said plasma generating chamber; a primary grid mounted on the outlet of said plasma generating chamber; a secondary grid placed at a fixed distance away from said primary grid; a beam width controller comprising an inlet, an outlet and a hollow inside, wherein the inlet is located on the side of said secondary grid, and the electron particles introduced through said inlet form electron beams of a pre-set beam width and are discharged through said outlet; and an RF shield ring disposed to surround the outer circumference of the inlet of said beam width controller. In the electron beam generator of the present invention, the electron particles discharged from said plasma generating chamber are delivered in the form of electron beams of a preset beam width to the outlet of said beam width controller.
Inventors:
KIM YONG-HWAN (KR)
Application Number:
PCT/KR2009/005985
Publication Date:
August 05, 2010
Filing Date:
October 16, 2009
Export Citation:
Assignee:
INFORVION CO LTD (KR)
KIM YONG-HWAN (KR)
KIM YONG-HWAN (KR)
International Classes:
H01J29/56; H01J29/54; H01J37/06
Attorney, Agent or Firm:
LEE, JI-YEON (KR)
이지연 (KR)
이지연 (KR)
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