ELECTRON BEAM INTERFERENCE DEVICE

WIPO Patent Application WO/2011/122139

A1

Disclosed is an interference optical system of a transmission electron microscope, wherein a means for disposing a first electron beam biprism (91) within a first imaging lens (61) in an imaging lens system is provided so that the first electron beam biprism is disposed in the vicinity of the upper side of the main surface of the first imaging lens, and a second electron beam biprism (93) is disposed in the vicinity of the lower side of the main surface of the first imaging lens. Thus, even when the conditions for irradiation of a sample with an electron beam are changed, the interference conditions (the interval (s) between interference stripes and the width (W) of an interference area) do not change, and an interference microscope image can be obtained.

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HARADA KEN (JP)
AKASHI TETSUYA (JP)

PCT/JP2011/053162

October 06, 2011

February 15, 2011

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HITACHI LTD (JP)
HARADA KEN (JP)
AKASHI TETSUYA (JP)

H01J37/295; H01J37/141

WO2010026867A1	2010-03-11
WO2006090556A1	2006-08-31

JP2005197165A	2005-07-21
JP2007115409A	2007-05-10
JP2009193834A	2009-08-27

TSUTSUI, YAMATO (JP)
Tsutsui Daiwa (JP)

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