Title:
ELECTRON BEAM IRRADIATION DEVICE FOR APERTURE VESSEL
Document Type and Number:
WIPO Patent Application WO/2009/139074
Kind Code:
A1
Abstract:
An electron beam irradiation device for an aperture vessel which significantly improves irradiation efficiency of an electron beam to the aperture vessel to achieve effective sterilization processing, as well as ensures reduced size and economical manufacturing. A rotary carrier (11) is arranged within an irradiation processing bath (10), and a plurality of holding mechanisms (2) for holding an aperture vessel (1) are provided at regular spacing intervals on the outer surface of the rotary carrier. A specific range of a carriage path formed between the irradiation processing bath (10) and the rotary carrier (11) is specified as an irradiation zone, and the inner and outer surfaces of the aperture vessel (1) are sterilized with an electron beam from an electron beam generator means (40) located above the carriage path. A rotary shaft (12) of the rotary carrier (11) is penetrated to a side of the electron beam generator means (40), and a grid plate (45) on an electron beam generation source (41) of the electron beam generator means (40) is rotatably attached to the rotary shaft (12). A plurality of emission outlets (46) are formed on the grid plate (45) at the same spacing intervals as the holding mechanisms (2) on the rotary carrier (11), and the emission outlets (46), an irradiation window (43) on the irradiation processing bath (10) and the holding mechanisms (2) for holding an aperture vessel (1) are located at almost the same vertical line within the irradiation zone.
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Inventors:
EGUCHI SHIRO (JP)
HIKOSAKA TOMOYUKI (JP)
GOHZAKI SATORU (JP)
SUZUKI TAKAYUKI (JP)
SATO SHIGEKATSU (JP)
HASHIMOTO ISAO (JP)
HIKOSAKA TOMOYUKI (JP)
GOHZAKI SATORU (JP)
SUZUKI TAKAYUKI (JP)
SATO SHIGEKATSU (JP)
HASHIMOTO ISAO (JP)
Application Number:
PCT/JP2008/059096
Publication Date:
November 19, 2009
Filing Date:
May 12, 2008
Export Citation:
Assignee:
JAPAN AE POWER SYSTEMS CORP (JP)
EGUCHI SHIRO (JP)
HIKOSAKA TOMOYUKI (JP)
GOHZAKI SATORU (JP)
SUZUKI TAKAYUKI (JP)
SATO SHIGEKATSU (JP)
HASHIMOTO ISAO (JP)
EGUCHI SHIRO (JP)
HIKOSAKA TOMOYUKI (JP)
GOHZAKI SATORU (JP)
SUZUKI TAKAYUKI (JP)
SATO SHIGEKATSU (JP)
HASHIMOTO ISAO (JP)
International Classes:
B65B55/08; A61L2/08; B65B55/04; G21K5/00; G21K5/04; G21K5/10
Domestic Patent References:
| WO2007046213A1 | 2007-04-26 |
Foreign References:
| JP2007522833A | 2007-08-16 | |||
| JPH11137645A | 1999-05-25 | |||
| JPH10268100A | 1998-10-09 | |||
| JPH111212A | 1999-01-06 | |||
| JP2002104334A | 2002-04-10 |
Other References:
See also references of EP 2292515A4
Attorney, Agent or Firm:
TAKADA, Yukihiko (Mito-shi, Ibaraki, JP)
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