Title:
ELECTRON BEAM IRRADIATION ENHANCEMENT APPARATUS AND METHOD OF USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2022/166626
Kind Code:
A1
Abstract:
An electron beam irradiation enhancement apparatus, comprising an electron beam source (1) and a sample (8), wherein the sample (8) is located below the electron beam source (1), the electron beam source (1) comprises a fixing housing, an outer wall of the top of the fixing housing is provided with a first fixing hole, a cathode (2) is arranged on an inner wall of the first fixing hole, an outer wall of a bottom end of the fixing housing is provided with a second fixing hole, and an anode (4) is arranged on an inner wall of the second fixing hole. A linear electron transmission channel (5), a linear shielding case (9), an electric field (13), a first electrode (15), a second electrode (16), a wavy electron transmission channel (17) and a wavy shielding case (18) are provided, and the use of a combination of one or more of the components can improve a bombardment effect on the sample (8) by changing the transmission direction of electrons and increasing the yield of electrons. Compared with the prior art, the apparatus significantly improves the electron utilization efficiency, makes full use of generated electrons, is simple in operation, is relatively low in cost, and reduces the waste of electrons.
Inventors:
TANG JIHONG JERRY (CN)
GU SHENGDONG (CN)
GU SHENGDONG (CN)
Application Number:
PCT/CN2022/073346
Publication Date:
August 11, 2022
Filing Date:
January 24, 2022
Export Citation:
Assignee:
HUZHOU ADVANCED ELECTRONIC TECH CO LTD (CN)
International Classes:
H01J37/28
Foreign References:
| JPH09219171A | 1997-08-19 | |||
| US20150270088A1 | 2015-09-24 | |||
| CN102592929A | 2012-07-18 | |||
| TW200949890A | 2009-12-01 | |||
| TW201021077A | 2010-06-01 | |||
| CN110838427A | 2020-02-25 |
Attorney, Agent or Firm:
SHANGHAI YUNHU PATENT AGENCY (GENERAL PARTNERSHIP) (CN)
Download PDF: