ELECTRON BEAM IRRADIATION METHOD AND SCANNING ELECTRONIC MICROSCOPE

WIPO Patent Application WO/2012/001883

A1

Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electronic microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.

KOBAYASHI, Kinya (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
小林　金也 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社　日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
YOKOSUKA, Toshiyuki (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)

JP2011/003214

January 05, 2012

June 08, 2011

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社　日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
KOBAYASHI, Kinya (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
小林　金也 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社　日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)

H01J37/147; H01J37/244; H01J37/28

INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)

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