Title:
ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJECTING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/210382
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing an electron gun with which the lifespan of a photocathode can be extended. The problem can be solved by this electron gun that includes: a substrate on a first surface of which a photocathode film is formed; a light source for projecting excitation light onto the photocathode film; an anode; a heating device for heating the photocathode film and/or the substrate; and an output adjusting device that adjusts the heating temperature of the heating device.
Inventors:
NISHITANI TOMOHIRO (JP)
SATO DAIKI (JP)
SATO DAIKI (JP)
Application Number:
PCT/JP2021/013455
Publication Date:
October 21, 2021
Filing Date:
March 30, 2021
Export Citation:
Assignee:
PHOTO ELECTRON SOUL INC (JP)
International Classes:
H01J37/073
Domestic Patent References:
| WO2015008561A1 | 2015-01-22 | |||
| WO2018186294A1 | 2018-10-11 |
Foreign References:
| JP6679014B1 | 2020-04-15 | |||
| JP6578529B1 | 2019-09-25 | |||
| JPH09298032A | 1997-11-18 | |||
| JP2002313273A | 2002-10-25 | |||
| JP6578529B1 | 2019-09-25 | |||
| JPS537779B1 | 1978-03-22 |
Other References:
DAIKI SATO ET AL., JPN. J. APPL. PHYS., 2016
Attorney, Agent or Firm:
MATSUMOTO Seiji (JP)
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