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Title:
ELECTRON MICROSCOPE DEVICE, INSPECTION SYSTEM USING ELECTRON MICROSCOPE DEVICE, AND INSPECTION METHOD USING ELECTRON MICROSCOPE DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/194304
Kind Code:
A1
Abstract:
An electron microscope device having: a detection part that detects reflected electrons which have reflected from a sample that has been irradiated with primary electrons emitted from a primary electron generation part (an electron gun); an image generation part that, on the basis of output from the detection part, generates an image of the surface of the sample that is based on the reflected electrons; and a processing part that generates a differential waveform signal for the image generated by the image generation part and uses information about the differential waveform signal to process the image and measure the dimensions of a pattern that is formed on the sample.

Inventors:
NISHIHATA Takahiro (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
OSAKI Mayuka (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
YAMAMOTO Takuma (24-14 Nishi-Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
HAMAGUCHI Akira (1-1 Shibaura 1-chome, Minato-k, Tokyo 23, 〒1050023, JP)
IIDA Yusuke (1-1 Shibaura 1-chome, Minato-k, Tokyo 23, 〒1050023, JP)
IDA Chihiro (1-1 Shibaura 1-chome, Minato-k, Tokyo 23, 〒1050023, JP)
Application Number:
JP2019/015148
Publication Date:
October 10, 2019
Filing Date:
April 05, 2019
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi-Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
International Classes:
G01B15/00; H01J37/22; H01J37/244; H01J37/28; H01L21/66
Foreign References:
JPS631910A1988-01-06
JP2017103363A2017-06-08
JP2015106530A2015-06-08
JP5313939B22013-10-09
US6472662B12002-10-29
Attorney, Agent or Firm:
SEIRYO I.P.C. (24-2, Hatchobori 2-chome Chuo-k, Tokyo 32, 〒1040032, JP)
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