ELECTRON MICROSCOPE

WIPO Patent Application WO/2018/189850

A1

Conventionally, in order to observe the entirety of a sample, the objective lens current is lowered to 1/6 of the current value used normally, reducing the magnetic field in the vicinity of the sample and achieving 50-fold magnification. Because of this, when a normally used observation magnification is set, the rising current is a factor in the occurrence of sample drift. In order to solve the problem, an electron microscope is provided, comprising an electron source irradiating an electron beam onto a sample, and a detector detecting electrons arising from the sample due to the electron beam irradiation, characterized in that, in the electron microscope, an upper objective lens coil and a lower objective lens coil are provided above and below the sample, the polarities of the upper objective lens coil and the lower objective lens coil being inverted with respect to one another.

JP2759841	PROBLEM TO BE SOLVED: To display a settable area of a beam adjustment parameter.
JP5210088	Electron beam device
JPH0616390	INDUSTRIAL APPLICABILITY: Beam automatic focus adjusting device

NAGAOKI ISAO (JP)
TAMURA KEIJI (JP)
FUJII TAKASHI (JP)
KOBAYASHI TAKAYUKI (JP)
KAGEYAMA KANEO (JP)
WADA TSUTOMU (JP)
MISE HIROMI (JP)
HIROTA TOSHIYA (JP)
INADA HIROSHI (JP)
KAMINOUCHI TAKU (JP)

PCT/JP2017/015072

October 18, 2018

April 13, 2017

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HITACHI HIGH TECH CORP (JP)

H01J37/141; H01J37/22; H01J37/26

JPS59171442A	1984-09-27
JPS6079653A	1985-05-07
JPH0992191A	1997-04-04
JPS6063866A	1985-04-12
JP2007052972A	2007-03-01
JPS58119146A	1983-07-15
JPS57151160A	1982-09-18
JPH04324239A	1992-11-13
JP2000311645A	2000-11-07
JPS5757460A	1982-04-06
US20150262784A1	2015-09-17

TODA Yuji (JP)

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