Title:
ELECTRON MULTIPLIER
Document Type and Number:
WIPO Patent Application WO/2019/003568
Kind Code:
A1
Abstract:
The present invention relates to an electron multiplier provided with a structure for suppressing and stabilizing resistance value fluctuations over a wider temperature range. In this electron multiplier, a resist layer that is held between a substrate and a secondary electron emission layer is configured from a PT layer that is formed two-dimensionally on a layer formation surface that coincides with or is substantially parallel to a channel formation surface of the substrate, and thereby, the resistance layer achieves a temperature characteristic in which the resistance value at -60°C falls within the range less than or equal to 10 times the resistance value at a temperature of 20°C, and the resistance value at +60°C within the range greater than or equal to 0.25 times said resistance value at 20°C.
Inventors:
MASUKO DAICHI (JP)
NISHIMURA HAJIME (JP)
HAMANA YASUMASA (JP)
WATANABE HIROYUKI (JP)
NISHIMURA HAJIME (JP)
HAMANA YASUMASA (JP)
WATANABE HIROYUKI (JP)
Application Number:
PCT/JP2018/015085
Publication Date:
January 03, 2019
Filing Date:
April 10, 2018
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
H01J43/24
Domestic Patent References:
| WO2013172417A1 | 2013-11-21 |
Foreign References:
| US20120187305A1 | 2012-07-26 | |||
| JP2016186939A | 2016-10-27 | |||
| JP2014067545A | 2014-04-17 | |||
| US8237129B2 | 2012-08-07 | |||
| US9105379B2 | 2015-08-11 |
Other References:
See also references of EP 3648141A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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