Title:
ELECTRON SOURCE AND CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/213109
Kind Code:
A1
Abstract:
The present invention makes it possible to stably emit a large-current electron beam from an electron gun of a charged particle beam device. The charged particle beam device is provided with an electron gun that has an SE tip (202), a suppressor (303) disposed in the rear of the leading end of the SE tip, and a cup-shaped extractor electrode (204) comprising a bottom surface and a cylindrical section, and in which the SE tip and the suppressor are contained in the extractor electrode and an insulator (208) that holds the suppressor and the extractor electrode is disposed between the suppressor and the extractor electrode. A shielding electrode (301) made of a conductive metal and having a cylindrical section (302) is disposed between the suppressor and the cylindrical section of the extractor electrode, and a voltage lower than the SE tip is applied to this shielding electrode.
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Inventors:
KASUYA KEIGO (JP)
IKEGAMI AKIRA (JP)
HONDA KAZUHIRO (JP)
FUKUTA MASAHIRO (JP)
DOI TAKASHI (JP)
KATAGIRI SOUICHI (JP)
TAKEI AKI (JP)
MATSUNAGA SOICHIRO (JP)
IKEGAMI AKIRA (JP)
HONDA KAZUHIRO (JP)
FUKUTA MASAHIRO (JP)
DOI TAKASHI (JP)
KATAGIRI SOUICHI (JP)
TAKEI AKI (JP)
MATSUNAGA SOICHIRO (JP)
Application Number:
PCT/JP2019/016563
Publication Date:
October 22, 2020
Filing Date:
April 18, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/06; H01J37/073
Foreign References:
| JPS5796450A | 1982-06-15 | |||
| JPH01260742A | 1989-10-18 | |||
| JPS5677084A | 1981-06-25 | |||
| JP2000294182A | 2000-10-20 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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