Title:
ELECTROSTATIC CHUCK DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/128348
Kind Code:
A1
Abstract:
This electrostatic chuck device (1) comprises an electrostatic chuck part (2), which has one primary surface as a supporting surface for supporting plate-shaped samples and in which internal electrodes for electrostatic adsorption are housed, and a cooling base part (3) for cooling the electrostatic chuck part (2), wherein a heating member (5) is adhered, via a first adhesive member layer (4), to the other primary surface of the electrostatic chuck part (2) on the side opposite the supporting surface; the electrostatic chuck part (2) and heating member (5), and the cooling base part (3) are integrally adhered via an acrylic adhesive agent layer (9) having flexibility and insulating properties performance.
Inventors:
MIURA YUKIO (JP)
MAETA SHINICHI (JP)
SATOU TAKASHI (JP)
FURUUCHI KEI (JP)
MAETA SHINICHI (JP)
SATOU TAKASHI (JP)
FURUUCHI KEI (JP)
Application Number:
PCT/JP2012/057483
Publication Date:
September 27, 2012
Filing Date:
March 23, 2012
Export Citation:
Assignee:
SUMITOMO OSAKA CEMENT CO LTD (JP)
MIURA YUKIO (JP)
MAETA SHINICHI (JP)
SATOU TAKASHI (JP)
FURUUCHI KEI (JP)
MIURA YUKIO (JP)
MAETA SHINICHI (JP)
SATOU TAKASHI (JP)
FURUUCHI KEI (JP)
International Classes:
H01L21/683
Domestic Patent References:
| WO2011093451A1 | 2011-08-04 |
Foreign References:
| JP2008085329A | 2008-04-10 | |||
| JP2008522446A | 2008-06-26 | |||
| JP2011049425A | 2011-03-10 | |||
| JP2009290071A | 2009-12-10 | |||
| JP2008300491A | 2008-12-11 | |||
| JP2010040644A | 2010-02-18 | |||
| JP2000100916A | 2000-04-07 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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Claims: