Title:
ELECTROSTATIC CHUCK MEMBER, ELECTROSTATIC CHUCK DEVICE, AND PRODUCTION METHOD FOR ELECTROSTATIC CHUCK MEMBER
Document Type and Number:
WIPO Patent Application WO/2023/120258
Kind Code:
A1
Abstract:
According to the present invention, an electrostatic chuck member comprises: a dielectric substrate that has a mounting surface for mounting a sample and includes a first support plate and a second support plate that are layered in the thickness direction; and an adsorption electrode that is embedded in the dielectric substrate. A gas channel is formed between the first support plate and the second support plate as a groove that is provided in at least one of the surfaces that are opposite each other and is covered by the other. The height-direction measurement of the gas channel is 90–300 μm, and the width measurement of the gas channel is at least 500 μm but less than 3000 μm.
Inventors:
INUI SATOYOSHI (JP)
ICHIYOSHI TAKU (JP)
OTSUKA TAKESHI (JP)
ICHIYOSHI TAKU (JP)
OTSUKA TAKESHI (JP)
Application Number:
PCT/JP2022/045561
Publication Date:
June 29, 2023
Filing Date:
December 09, 2022
Export Citation:
Assignee:
SUMITOMO OSAKA CEMENT CO LTD (JP)
International Classes:
H02N13/00; C04B37/00; H01L21/683
Foreign References:
JP2014165405A | 2014-09-08 | |||
JP2016207931A | 2016-12-08 | |||
JP2013012616A | 2013-01-17 | |||
JP2017208527A | 2017-11-24 | |||
JP2013074251A | 2013-04-22 | |||
JP2021141116A | 2021-09-16 | |||
JP2018073613A | 2018-05-10 | |||
US20010024349A1 | 2001-09-27 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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