Title:
ELECTROSTATIC CHUCK AND PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/195672
Kind Code:
A1
Abstract:
An electrostatic chuck (13) is equipped with: a dielectric layer (41) that is provided with a board-shaped tray supporting section (41a) having a surface (41S), and a substrate supporting section (41b) protruding from the surface (41S); a substrate electrode (42) for attracting a substrate to the substrate supporting section (41b), said substrate electrode being positioned inside of the substrate supporting section (41b); and a tray electrode (43) for attracting, to the tray supporting section (41a), a tray on which the substrate is placed, said tray electrode being positioned inside of the tray supporting section (41a).
Inventors:
SAKATA GENJI (JP)
YOKOO HIDEKAZU (JP)
AIHARA TSUYOSHI (JP)
KITAGAWA MASARU (JP)
WATANABE AKIRA (JP)
YOKOO HIDEKAZU (JP)
AIHARA TSUYOSHI (JP)
KITAGAWA MASARU (JP)
WATANABE AKIRA (JP)
Application Number:
PCT/JP2017/017005
Publication Date:
November 16, 2017
Filing Date:
April 28, 2017
Export Citation:
Assignee:
ULVAC INC (JP)
International Classes:
H01L21/683; H01L21/3065; H02N13/00
Domestic Patent References:
WO2010109848A1 | 2010-09-30 |
Foreign References:
JP2013045989A | 2013-03-04 | |||
JP2014150186A | 2014-08-21 | |||
JP2011114178A | 2011-06-09 | |||
JP2011003913A | 2011-01-06 |
Attorney, Agent or Firm:
ONDA, Makoto et al. (JP)
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