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Patent Searching and Data


Title:
ELECTROSTATIC CHUCK AND VACUUM PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2010/024146
Kind Code:
A1
Abstract:
Provided is an electrostatic chuck which can surely hold a translucent substrate to be processed even when an attracting force is deteriorated due to photoelectric effects, at the time of performing processing, including light irradiation, to the substrate by making the electrostatic chuck hold the substrate. An electrostatic chuck (6) is provided with a chuck plate (61) composed of a dielectric material, and a first electrode (631) and a second electrode (632) arranged on the chuck plate (61), and a voltage is applied to between the first and the second electrodes (631, 632), and a substrate (S) to be processed is attracted to a surface of the chuck plate (61).  On one part of the surface of the chuck plate (61), a substrate holding section (64) composed of an adhesive sheet or the like having an adhesive force to the substrate (S) is arranged.

Inventors:
SATOU, Tadayuki (Inc. Fuji Susono Kojo, 1220-14, Suyama, Susono-sh, Shizuoka 31, 〒4101231, JP)
佐藤 正幸 (〒31 静岡県裾野市須山1220-14 株式会社アルバック 富士裾野工場内 Shizuoka, 〒4101231, JP)
OKA, Tadashi (Inc. Fuji Susono Kojo, 1220-14, Suyama, Susono-sh, Shizuoka 31, 〒4101231, JP)
Application Number:
JP2009/064415
Publication Date:
March 04, 2010
Filing Date:
August 17, 2009
Export Citation:
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Assignee:
ULVAC, INC. (2500, Hagisono Chigasaki-sh, Kanagawa 43, 〒2538543, JP)
株式会社アルバック (〒43 神奈川県茅ヶ崎市萩園2500番地 Kanagawa, 〒2538543, JP)
SATOU, Tadayuki (Inc. Fuji Susono Kojo, 1220-14, Suyama, Susono-sh, Shizuoka 31, 〒4101231, JP)
佐藤 正幸 (〒31 静岡県裾野市須山1220-14 株式会社アルバック 富士裾野工場内 Shizuoka, 〒4101231, JP)
International Classes:
H01L21/683; H02N13/00
Attorney, Agent or Firm:
SEIGA Patent and Trademark Corporation (9th Fl, Saisho Bldg. 1-14 Nishi-Gotanda 8-chome, Shinagawa-k, Tokyo 31, 〒1410031, JP)
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