Title:
EMBOSSED-PATTERN TRANSFER SHEET AND METHOD OF PATTERN TRANSFER
Document Type and Number:
WIPO Patent Application WO/1994/029128
Kind Code:
A1
Abstract:
A transfer sheet (10) for an embossed pattern comprises a base film (11) on which a mold release layer (12), a coloring layer (13), a reflection layer (14) and a photosensitive resin layer (15) are laminated. When symbols are formed on a dial of a timepiece, the photosensitive resin layer (15) is first exposed through a negative film (16), which includes opaque regions (161) corresponding to the symbols. Accordingly, when the photosensitive resin layer (15) is immersed in water and developed, the mold release layer (12), the coloring layer (13), the reflection layer (14) and a patterned resin layer (150) are left on the base film (11). Then, a pressure-sensitive adhesive layer (17) is formed on only the surface of the patterned resin layer (150), and the transfer sheet (10) and the dial are bonded. Thereafter, when the transfer sheet (10) is peeled from the dial, the reflection layer (14) and the coloring layer (13) corresponding to the formation portion of the patterned resin layer (150) are transferred to the dial.
Inventors:
KOBAYASHI KOICHI (JP)
IWANAMI WATARU (JP)
KANAI TAIYO (JP)
HORIUCHI HIDEKI (JP)
IWANAMI WATARU (JP)
KANAI TAIYO (JP)
HORIUCHI HIDEKI (JP)
Application Number:
PCT/JP1994/000831
Publication Date:
December 22, 1994
Filing Date:
May 25, 1994
Export Citation:
Assignee:
SEIKO EPSON CORP (JP)
KOBAYASHI KOICHI (JP)
IWANAMI WATARU (JP)
KANAI TAIYO (JP)
HORIUCHI HIDEKI (JP)
KOBAYASHI KOICHI (JP)
IWANAMI WATARU (JP)
KANAI TAIYO (JP)
HORIUCHI HIDEKI (JP)
International Classes:
B32B38/10; B32B38/14; B44C1/17; B44C1/22; G04B19/10; G04B19/12; G04D3/00; G03F7/40; (IPC1-7): B44C1/17
Foreign References:
| JPS6311389A | 1988-01-18 | |||
| JPS59182782A | 1984-10-17 |
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