Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EMITTER, GAS FIELD IONIZATION ION SOURCE, AND ION BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/035411
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an emitter in which there is no ion extraction voltage fluctuation such that the axis adjustment of an ion optical system is needed even if regeneration treatment of an apex part is repeated, a gas field ionization ion source using the same, and an ion beam device. This emitter (1) used in a gas field ionization ion source comprises a base part produced from single crystal metal, and a needle-shaped leading end part (1-1), the leading end part is formed in a triangular pyramid shape with a single atom as an apex (1-2), and an upper surface end part (1-4) when the leading end part is viewed from the apex side is formed in an approximately hexagonal shape.

Inventors:
KAWANAMI YOSHIMI (JP)
MORITANI HIRONORI (JP)
MUTO HIROYUKI (JP)
Application Number:
PCT/JP2012/065676
Publication Date:
March 14, 2013
Filing Date:
June 20, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI HIGH TECH CORP (JP)
KAWANAMI YOSHIMI (JP)
MORITANI HIRONORI (JP)
MUTO HIROYUKI (JP)
International Classes:
H01J27/26; H01J37/08; H01J37/317
Foreign References:
JP2010205426A2010-09-16
JPH1092361A1998-04-10
JPS6264017A1987-03-20
JP2009301920A2009-12-24
JP2009164110A2009-07-23
JP2011082056A2011-04-21
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Download PDF:
Claims: