Title:
END HAT FOR MAGNETRON, PROCESS FOR PRODUCING SAME, AND MAGNETRON
Document Type and Number:
WIPO Patent Application WO/2012/008580
Kind Code:
A1
Abstract:
Disclosed is an end hat for magnetrons which is constituted of sintered Mo, characterized in that the surface area ranging from the surface of the sintered Mo to a depth of 100 µm therefrom has a carbon content of 30 ppm or less and the central area ranging from the thickness-direction center of the sintered Mo to distances of ±100 µm therefrom has a carbon content of 50-300 ppm. By reducing the carbon content in the surface area, long-term reliability can be improved. The end hat for magnetrons which has high long-term reliability can be produced in a high yield.
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Inventors:
MORIOKA, Tsutomu (())
森岡 勉 (())
森岡 勉 (())
Application Number:
JP2011/066243
Publication Date:
January 19, 2012
Filing Date:
July 15, 2011
Export Citation:
Assignee:
KABUSHIKI KAISHA TOSHIBA (1-1 Shibaura 1-Chome, Minato-Ku Tokyo, 01, 〒1058001, JP)
株式会社東芝 (〒01 東京都港区芝浦一丁目１番１号 Tokyo, 〒1058001, JP)
TOSHIBA MATERIALS CO., LTD. (8 Shinsugita-Cho, Isogo-Ku Yokohama-Sh, Kanagawa 32, 〒2350032, JP)
東芝マテリアル株式会社 (〒32 神奈川県横浜市磯子区新杉田町８番地 Kanagawa, 〒2350032, JP)
株式会社東芝 (〒01 東京都港区芝浦一丁目１番１号 Tokyo, 〒1058001, JP)
TOSHIBA MATERIALS CO., LTD. (8 Shinsugita-Cho, Isogo-Ku Yokohama-Sh, Kanagawa 32, 〒2350032, JP)
東芝マテリアル株式会社 (〒32 神奈川県横浜市磯子区新杉田町８番地 Kanagawa, 〒2350032, JP)
International Classes:
H01J23/04
Attorney, Agent or Firm:
HATANO, Hisashi et al. (TOKYO INTERNATIONAL PATENT FIRM, 2nd Floor Miyata Building, 17-16, Nishi-Shimbashi 1-Chome,Minato-K, Tokyo 03, 〒1050003, JP)
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Claims: