Title:
ESTER-DIAMINE-CONTAINING POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2020/188921
Kind Code:
A1
Abstract:
[Problem] To provide a photosensitive resin composition including an ester-diamine-containing polybenzoxazole precursor that achieves high dissolution contrast and furthermore is resistant to cracking and warping. [Solution] This ester-diamine-containing polybenzoxazole precursor is characterized by having a structure represented by general formula (1) and/or (2) and a structure represented by general formula (3).
Inventors:
AKIMOTO MAHO (JP)
Application Number:
PCT/JP2019/049284
Publication Date:
September 24, 2020
Filing Date:
December 17, 2019
Export Citation:
Assignee:
TAIYO HOLDINGS CO LTD (JP)
International Classes:
C08G73/22; G03F7/004; G03F7/023
Domestic Patent References:
| WO2016129546A1 | 2016-08-18 |
Foreign References:
| JP2018118947A | 2018-08-02 | |||
| JP2007112990A | 2007-05-10 | |||
| JP2019059959A | 2019-04-18 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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