Title:
ETCHING DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/043947
Kind Code:
A1
Abstract:
An etching device (1) is provided with: a chemical treatment tank (20), in which a substrate (2) is transferred; and a jetting section (21), which is disposed in the chemical treatment tank (20), and which has a blowout port (22) facing the direction not intersecting the surface of the substrate (2), said jetting section jetting a mist-like etchant chemical (22) through the blowout port (22).
Inventors:
TANIYAMA HIROKI
OKABE TOHRU
SAIDA SHINSUKE
ICHIKAWA SHINJI
GUNJI RYOSUKE
NAKADA YOSHIHIRO
INOUE AKIRA
JINMURA HIROHARU
OKABE TOHRU
SAIDA SHINSUKE
ICHIKAWA SHINJI
GUNJI RYOSUKE
NAKADA YOSHIHIRO
INOUE AKIRA
JINMURA HIROHARU
Application Number:
PCT/JP2017/031799
Publication Date:
March 07, 2019
Filing Date:
September 04, 2017
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
H01L27/32; H05B33/10; H01L51/50; H05B33/02
Foreign References:
| JP2004089866A | 2004-03-25 | |||
| JP2004186042A | 2004-07-02 | |||
| JP2009010033A | 2009-01-15 | |||
| JP2001148363A | 2001-05-29 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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