Title:
ETCHING DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/011171
Kind Code:
A1
Abstract:
Disclosed is an etching device that uses a plasma to etch a target object. Said device has a stage, a plasma-generation means, a central electrode, and an outer electrode. The stage has a mounting surface on which the target object is placed. The plasma-generation means generates a plasma in a high concentration in a space, above the stage, surrounding the central axis of the mounting surface. The central electrode is disposed, below the space in which the plasma-generation means generates the aforementioned plasma, at a position through which the aforementioned central axis passes. The outer electrode is disposed above the stage and below the central electrode, and viewed along the aforementioned central axis, extends around the periphery of the central electrode. The central electrode and the outer electrode are designed such that the electric potentials thereof are controllable.
Inventors:
KAMIJO Takuma (1 Toyota-cho, Toyota-sh, Aichi 71, 〒4718571, JP)
Application Number:
JP2010/062267
Publication Date:
January 26, 2012
Filing Date:
July 21, 2010
Export Citation:
Assignee:
TOYOTA JIDOSHA KABUSHIKI KAISHA (1 Toyota-cho, Toyota-shi Aichi, 71, 〒4718571, JP)
トヨタ自動車株式会社 (〒71 愛知県豊田市トヨタ町１番地 Aichi, 〒4718571, JP)
トヨタ自動車株式会社 (〒71 愛知県豊田市トヨタ町１番地 Aichi, 〒4718571, JP)
International Classes:
H01L21/3065; H05H1/46
Attorney, Agent or Firm:
KAI-U PATENT LAW FIRM (NISSEKI MEIEKI BUILDING 7F, 45-14 Meieki 2-chome, Nakamura-ku, Nagoya-sh, Aichi 02, 〒4500002, JP)
Claims:
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