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Title:
ETCHING LIQUID COMPOSITION AND ETCHING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/008745
Kind Code:
A1
Abstract:
Provided are: an etching liquid composition which is capable of collectively etching a tungsten film and a titanium nitride film; and an etching method which uses this etching liquid composition. An etching liquid composition according to the present invention contains nitric acid and water, and is used for the purpose of collectively etching a tungsten film and a titanium nitride film.

Inventors:
KOUNO RYOU (JP)
OHWADA TAKUO (JP)
Application Number:
PCT/JP2017/024971
Publication Date:
January 11, 2018
Filing Date:
July 07, 2017
Export Citation:
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Assignee:
KANTO KAGAKU (JP)
International Classes:
H01L21/308; C23F1/26; H01L21/3213; H01L21/768
Foreign References:
US20150200112A12015-07-16
KR101587758B12016-01-21
JP2013033942A2013-02-14
JPH07122651A1995-05-12
JP2001077118A2001-03-23
Attorney, Agent or Firm:
KUZUWA, Kiyoshi (JP)
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