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Patent Searching and Data


Title:
ETCHING LIQUID FOR CONDUCTIVE POLYMER AND METHOD FOR PATTERNING CONDUCTIVE POLYMER
Document Type and Number:
WIPO Patent Application WO/2008/041461
Kind Code:
A1
Abstract:
Disclosed is an etching liquid for conductive polymers, which exhibits excellent etching performance to conductive polymers. Also disclosed is a method for patterning a conductive polymer by using such an etching liquid for conductive polymers. Specifically disclosed is an etching liquid for conductive polymers, which is characterized by being selected from the group consisting of (1) an etching liquid containing (NH4)2Ce(NO3)6 or Ce(SO4)2, (2) an etching liquid containing (NH4)4Ce(SO4)4, (3) an aqueous hypochlorite solution, (4) an etching liquid containing nitrosyl chloride, (5) an etching liquid containing a bromic acid compound and an inorganic acid, (6) an etching liquid containing a chloric acid compound and a hydrogen halide, (7) an etching liquid containing a permanganic acid compound and (8) an etching liquid containing a hexavalent chromium compound.

Inventors:
IHARA, Takashi (C/O TOAGOSEI CO. LTD, 17-23, Showa-cho, Minato-ku, Nagoya-sh, Aichi 26, 4550026, JP)
井原 孝 (〒26 愛知県名古屋市港区昭和町17番地の23 東亞合成株式会社内 Aichi, 4550026, JP)
Application Number:
JP2007/067806
Publication Date:
April 10, 2008
Filing Date:
September 13, 2007
Export Citation:
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Assignee:
TSURUMI SODA CO., LTD. (1-7 Suehiro-cho, Tsurumi-ku Yokohama-sh, Kanagawa 45, 2300045, JP)
鶴見曹達株式会社 (〒45 神奈川県横浜市鶴見区末広町1丁目7番地 Kanagawa, 2300045, JP)
TOAGOSEI CO., LTD. (1-14-1, Nishi-Shimbashi Minato-k, Tokyo 19, 1058419, JP)
東亞合成株式会社 (〒19 東京都港区西新橋1丁目14番1号 Tokyo, 1058419, JP)
International Classes:
H01B13/00; C08J7/00; H01L21/306
Attorney, Agent or Firm:
NOGUCHI, Yasuhiro (NOGUCHI PATENT FIRM, Urban Toranomon Bldg. 16-4,Toranomon 1-chome, Minato-k, Tokyo 01, 1050001, JP)
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