Title:
ETCHING LIQUID FOR SEMICONDUCTOR SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2015/041214
Kind Code:
A1
Abstract:
The present invention relates to an alkaline etching liquid for processing the surface of a semiconductor substrate for a solar battery, the etching liquid including at least one item selected from the group comprising lignin sulphonic acid and salts thereof. Use of the etching liquid of the present invention exhibits the effects of excellent productivity and of being able to form a texture in a short amount of time at relatively low temperatures. Further, the etching liquid produces the effects of the refinement and excellent surface elimination of the bubbles that are generated in large amounts during multi-sheet processing, and yield is increased because floating of a substrate during etching can be eliminated. In addition, textures having excellent surface quality can be formed because surface defects are reduced.
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Inventors:
YAMAMOTO YUZO
SAIDA TOSHINORI
OHYAGI NOBORU
KAMADA YOSHITERU
SAIDA TOSHINORI
OHYAGI NOBORU
KAMADA YOSHITERU
Application Number:
PCT/JP2014/074442
Publication Date:
March 26, 2015
Filing Date:
September 16, 2014
Export Citation:
Assignee:
SETTSU OIL MILL INC (JP)
International Classes:
H01L21/308; C09K13/04; H01L31/0236
Domestic Patent References:
| WO2012023613A1 | 2012-02-23 | |||
| WO2014010471A1 | 2014-01-16 |
Foreign References:
| JP2005019605A | 2005-01-20 | |||
| JP2012114449A | 2012-06-14 | |||
| US20130130508A1 | 2013-05-23 | |||
| JP2007258656A | 2007-10-04 | |||
| JP2012004528A | 2012-01-05 | |||
| JP2013089629A | 2013-05-13 |
Attorney, Agent or Firm:
HOSODA, YOSHINORI (JP)
Yoshinori Hosoda (JP)
Yoshinori Hosoda (JP)
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