ETCHING MASK, MANUFACTURING METHOD THEREFOR, POROUS MEMBRANE MANUFACTURING METHOD USING ETCHING MASK, POROUS MEMBRANE, FINE DUST-BLOCKING MASK INCLUDING POROUS MEMBRANE, AND MANUFACTURING METHOD FOR SURFACE ENHANCED RAMAN SCATTERING ACTIVE SUBSTRATE

Title:

Document Type and Number:

WIPO Patent Application WO/2016/032270

Kind Code:

A1

Abstract:

According to the present invention, in an etching mask, a manufacturing method therefor, a porous membrane manufacturing method, the porous membrane, a fine dust-blocking mask, and a surface enhanced Raman scattering active substrate manufacturing method, the etching mask comprises: an organic film; and a pattern layer arranged on the organic film and having openings formed in the shape of a micro hole or a nano hole and having a uniform size.

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Inventors:

YANG SEUNG YUN (KR)
LEE SEUNGHYUN (KR)

Application Number:

PCT/KR2015/009033

Publication Date:

March 03, 2016

Filing Date:

August 28, 2015

Export Citation:

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Assignee:

PUSAN NAT UNIV IND COOP FOUND (KR)

International Classes:

B01D69/00; B01D67/00; B01J19/00; C08J9/00

Foreign References:

KR20130142090A	2013-12-27
KR20050078975A	2005-08-08
KR20090000428A	2009-01-07
KR101358143B1	2014-02-04
KR20090004180A	2009-01-12

Attorney, Agent or Firm:

NAM, Gunpil et al. (KR)
남건필 (KR)

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