ETCHING PASTE HAVING DOPING FUNCTION, AND FORMATION METHOD OF SELECTIVE EMITTER OF SOLAR CELL USING SAME

Title:

ETCHING PASTE HAVING DOPING FUNCTION, AND FORMATION METHOD OF SELECTIVE EMITTER OF SOLAR CELL USING SAME

Document Type and Number:

WIPO Patent Application WO/2010/143794

Kind Code:

A1

Abstract:

The present invention provides an etching paste having a doping function. The etching paste etches a thin film on a silicon wafer and comprises a) an n- or p-dopable dopant; b) a binder; and c) a solvent. The etching paste having a doping function of the present invention is doped on a silicon wafer simultaneously with the etching of a thin film formed on one surface of the silicon wafer by firing, and does not need an additional washing process even after a doping process or an etching process since the etching paste does not contain a fluorine compound or a phosphorus compound.

More Like This:

JP2008066747	SEMICONDUCTOR WAFER CLEANING COMPOSITION USING WATER AMMONIUM FLUORIDE AND AMINE
JP4471448	Method for Purifying Tetrafluoromethane and Its Applications

Inventors:

KIM DONG JUN (KR)
OKAMOTO KUNINORI (KR)
LEE BYUNG CHUL (KR)
JUNG SEOK HYUN (KR)

Application Number:

PCT/KR2009/007138

Publication Date:

December 16, 2010

Filing Date:

December 02, 2009

Export Citation:

Click for automatic bibliography generation Help

Assignee:

CHEIL IND INC (KR)
KIM DONG JUN (KR)
OKAMOTO KUNINORI (KR)
LEE BYUNG CHUL (KR)
JUNG SEOK HYUN (KR)

International Classes:

C09K13/00

Foreign References:

KR20070028579A	2007-03-12
US20090120490A1	2009-05-14
KR20090050558A	2009-05-20
KR20080090055A	2008-10-08
JP2009129600A	2009-06-11

Attorney, Agent or Firm:

AJU KIM CHANG & LEE (KR)
특허법인아주양헌 (KR)

Download PDF:

View/Download PDF PDF Help

Previous Patent: ELECTRODE FOR ANODE CONTAINING ADDITIVE AND METAL SULFIDE, PREPARATION METHOD THEREOF, AND BATTERY U...

Next Patent: PULLEY CHAIN GEAR USING PRINCIPLE OF PULLEY