ETCHING SOLUTION CONCENTRATION MEASUREMENT APPARATUS AND METHOD

WIPO Patent Application WO/2015/135230

A1

An etching solution concentration measurement apparatus and method. The measurement apparatus comprises a concentration measurement mechanism and an acid mist removing mechanism connected to the concentration measurement mechanism. The acid mist removing mechanism is used for removing acid mist inside the concentration measurement mechanism. The concentration measurement mechanism is used for receiving an etching solution in real time, measuring absorbance of acids in a mixed acid of the etching solution in a no-acid-mist environment, and calculating the concentrations of the acids in the mixed acid of the etching solution according to the absorbance. The concentration measurement apparatus overcomes the interference of the acid mist with the measurement of the acid concentration of the mixed acid of the etching solution, so as to rapidly and accurately measure the concentrations of the acids in the mixed acid of the etching solution in an online manner; dried gas is circularly used, and the objective of saving resources is achieved.

WO/2021/204450	OPEN-LOOP/CLOSED-LOOP PROCESS CONTROL ON THE BASIS OF A SPECTROSCOPIC DETERMINATION OF UNDETERMINED SUBSTANCE CONCENTRATIONS
WO/2015/199911	METHODS AND SYSTEMS FOR DETECTING A CHEMICAL SPECIES
WO/2012/032197	METHOD AND DEVICE FOR DETERMINING THE STATE OF DEGRADATION OF A LUBRICANT OIL

XU RUI (CN)
ZHANG WEIWEI (CN)

PCT/CN2014/074265

September 17, 2015

March 28, 2014

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SHENZHEN CHINA STAR OPTOELECT (CN)

G01N21/31

CN1667514A	2005-09-14
CN103180029A	2013-06-26
CN101567309A	2009-10-28
CN102778532A	2012-11-14
CN202683059U	2013-01-23
US5897378A	1999-04-27

SHENZHEN STANDARD PATENT & TRADEMARK AGENT LTD. (CN)
深圳市顺天达专利商标代理有限公司 (CN)

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