Title:
SULFOXIDE/GLYCOL ETHER BASED SOLVENTS FOR USE IN THE ELECTRONICS INDUSTRY
Document Type and Number:
WIPO Patent Application WO/2018/058341
Kind Code:
A1
Abstract:
Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N, N-dimethyl propionamide, 3-methoxy-N, N-dimethyl propanamide, and triethyl phosphate.
Inventors:
JIANG QI (CN)
REN HUA (CN)
JIANG XIN (CN)
KIM EUNG KYU (US)
REN HUA (CN)
JIANG XIN (CN)
KIM EUNG KYU (US)
Application Number:
PCT/CN2016/100460
Publication Date:
April 05, 2018
Filing Date:
September 28, 2016
Export Citation:
Assignee:
DOW GLOBAL TECHNOLOGIES LLC (US)
JIANG QI (CN)
REN HUA (CN)
JIANG XIN (CN)
KIM EUNG KYU (US)
JIANG QI (CN)
REN HUA (CN)
JIANG XIN (CN)
KIM EUNG KYU (US)
International Classes:
G03F7/42
Foreign References:
| CN104597728A | 2015-05-06 | |||
| CN101866118A | 2010-10-20 | |||
| CN103424999A | 2013-12-04 | |||
| KR20140087758A | 2014-07-09 |
Attorney, Agent or Firm:
WU, FENG & ZHANG CO. (CN)
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