Title:
EUV LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/051454
Kind Code:
A1
Abstract:
This EUV light generation device is to be used along with a laser device that outputs laser light. The EUV light generation device comprises: a chamber wherein an EUV light is generated from a plasma, which is produced by irradiating the laser light onto a target in a generation region inside the chamber; a target supply apparatus for outputting the target as a droplet towards the generation region within the chamber; a droplet detector for detecting the droplet in a detection region between the target supply apparatus and the generation region; and a control unit for sending a trigger signal to the laser device, and for providing the laser device with a trigger for outputting the laser light. The droplet detector sends a passage timing signal to the control unit, indicating the timing of the droplet passage through the detection region. The control unit may include a noise compensation unit to compensate for a noise which is superimposed with the passage timing signal and originates from an electromagnetic wave that has been irradiated from the plasma, the control unit may be sending the trigger signal to the laser device on the basis of the passage timing signal which has been compensated for the noise by the noise compensation unit.
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Inventors:
YABU TAKAYUKI (JP)
Application Number:
PCT/JP2015/076912
Publication Date:
March 30, 2017
Filing Date:
September 24, 2015
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; G02B3/00; G03F7/20
Foreign References:
| JP2011238921A | 2011-11-24 | |||
| JP2007123294A | 2007-05-17 | |||
| JP2006505960A | 2006-02-16 | |||
| JPS632300A | 1988-01-07 |
Attorney, Agent or Firm:
MATSUURA Kenzo (JP)
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